Used LEICA / VISTEC LDS 300M #9249428 for sale

LEICA / VISTEC LDS 300M is a high-tech mask and wafer inspection equipment that was designed to meet the advanced needs of photomask and wafer manufacturers. The system enables rapid, accurate and highly detailed defect detection. LEICA LDS 300M combines advanced Laser Diode Scanning (LDS) technology with powerful imaging software to detect defects as small as 0.6 μm. VISTEC LDS 300M is designed to easily inspect 200mm and 300mm size masks and wafers, with a maximum field of view of 25 mm x 25 mm and a maximum resolution of 3 μm. The unit's automatic calibration ensures that the inspected and reference photomasks are precisely aligned for detailed visualization and defect analysis. LDS 300M's unique illumination machine includes Variable Triangle and Variable Pulse Imaging™, which provides high-contrast, high-resolution images from variable angles and variable pulse lighting. This ensures that defects, even small drifts and micro-cracks, are detected and analyzed with confidence. Additionally, LEICA / VISTEC LDS 300M can perform inspection, review, and analysis of large areas with high speed, accuracy, and reliability. LEICA LDS 300M also features advanced defect classification tools, including algorithms to automatically identify anomalies in the inspected masks and wafers. The tool's advanced software package includes several classification documents that provide step-by-step instructions on how to set up and analyze test results. Additionally, VISTEC LDS 300M's inspection results can be stored on cassette tape, as JPEG files, and can be exported via USB. LDS 300M is a powerful and reliable asset designed to detect and analyze even the smallest defects in photomask and wafer technology. The model's advanced LDS and imaging technologies, combined with its intuitive software and user-friendly operating systems, ensure accurate defect detection and analysis. Furthermore, LEICA / VISTEC LDS 300M is the ideal solution for photomask and wafer manufacturers that are looking for a reliable, high-performance mask and wafer inspection equipment.