Used LEICA / VISTEC LDS 3300M #180137 for sale

LEICA / VISTEC LDS 3300M is an advanced mask and wafer inspection equipment designed for the semiconductor industry. It incorporates the industry leading LEICA 3D automated microscopy technology, enabling high-resolution defect detection even during complex 3D optical inspection.This system provides full wafer visualization with true metrology capabilities, ensuring fast and accurate results with no manual intervention. LEICA LDS3300M is capable of detecting and analyzing specific structural defects, pattern distortions and contaminate particles on masks and wafers. It uses pattern recognition capabilities to detect subtle shape or size differences in the patterns and reconstruct a 3-dimensional image based on high-resolution optical inspection data. The 3D images can then be evaluated and inspected at the nanometer level. The unit is equipped with a high-precision wafer stage and a proprietary image-processing software, allowing users to easily and quickly detect small defects from complex mask and wafer patterns. The advanced optical design of the machine also ensures maximum resolution and dynamic range in a wide variety of lighting conditions. VISTEC LDS 3300 M offers a wide range of inspection capabilities, including scanning at a variety of fields of view, scan sizes, and multiple pattern depths. Other features include automated auto-focusing and auto-exposure modes, multi-layer defect review and statistical analysis of results. Advanced image processing algorithms provide instant access to defect results and measure analysis data. The tool also supports image analysis in multiple different formats and can be used in conjunction with optical probing tools. LDS 3300 M asset is designed with operator safety in mind and user-friendly in operation. It is suitable for the most demanding semiconductor fabrication environments and is easy to install, operate, and maintain. The model offers high throughput capability for high device counts and fast sampling speed for quick analysis. These features, combined with its reliable performance, make it an ideal tool for semiconductor mask and wafer inspection.