Used LEICA / VISTEC MIS 200 #293671054 for sale

LEICA / VISTEC MIS 200 Mask and Wafer Inspection System is a fully automated metrology instrument designed for use in the semiconductor industry. Its primary purpose is to quickly and accurately detect defects and imperfections in lithographic masks or wafers. It offers pinpoint accuracy, high throughput, and reliable data collection. The system is equipped with advanced optical imaging, X-ray light emission and detection systems, and robust algorithms to detect defects. It is engineered for efficient operation and can easily be integrated with other advanced tools. LEICA MIS 200 incorporates a Laser Confocal Microscope to provide two-dimensional (2D) images featuring excellent contrast between features in the mask or wafer. The resolution of the scanned images can reach 200 nanometers (nm) which can effectively detect microscopic defects. Additionally, four-dimensional (4D) Scanning X-ray Microscopy (SXM) is used to detect three-dimensional (3D) defects or topological changes in the material. With X-ray technology, up to 1000 nm resolution can be obtained while scanning over a larger surface area. VISTEC MIS 200 also features a UV Filter that enables inspection in the ultraviolet (UV) range. This feature makes it possible to visualize the ultraviolet (UV) light reflectivity differences between the defects and the wafer material. Both forward (FS) and darkfield (DF) imaging options can be selected to best analyze the surface of the wafer or mask in question. The defect detector is programmed to evaluate the incoming data and identify any imperfections. Its algorithms are designed to detect flaws regardless of size, shape, angle, or contrast. A unique optical beam profile also allows simultaneous analysis of several images in order to identify and size defects. Data collected from MIS 200 is easy to interpret using a graphical user interface (GUI) and can be used to produce complete defect, film, and overlay images. These images can be sent electronically or printed for review, measuring, and optimization. Its automated functionality and user-friendly design make LEICA / VISTEC MIS 200 an ideal choice for mask and wafer inspection applications.