Used LEICA / VISTEC MIS 200 #293671055 for sale

LEICA / VISTEC MIS 200 is an innovative mask and wafer inspection equipment designed to examine the integrity of photolithography patterns during the production process. It features a unique design of imaging optics, combined with special processing algorithms, allowing high-resolution images of nano-scale features to be formed and analysed quickly and accurately. The imaging optics employed within LEICA MIS 200 are based on a high-numerical-aperture (N.A.) condenser, combined with a field-selective objective lens and a cooled digital camera. The system is able to quickly acquire high-resolution images of nano-scale patterns with a wide field of view. The resulting images are extremely accurate, with details down to less than 1 nanometer visible. Furthermore, the unit is capable of acquiring interference patterns that can be used to accurately measure the quality of the patterns and to perform defect identification. The powerful software algorithms employed by VISTEC MIS 200 can extract information from the acquired images that is extremely useful for defect analysis. For example, the machine is able to detect even very small deviations in the geometrical characteristics of any pattern, as well as identify critical defects on a wafer. Furthermore, the software is capable of automatically measuring the contact resistances of an array of devices, thereby allowing for a fast and reliable evaluation of critical device parameters. MIS 200 tool is also equipped with a number of features for data management. These features include a traceability asset that allows for comprehensive tracking of all acquired images, as well as a data storage feature to store all acquired images and results for future reference. LEICA / VISTEC MIS 200 is thus an industry-standard tool for inspecting nano-scale features in photolithography processes. It is capable of acquiring very high-resolution images, allowing for thorough defect analysis and detailed evaluation of the quality of devices. Furthermore, the model also features advanced data management and traceability features, allowing users to store and access all acquired images and results.