Used LEICA / VISTEC MIS 200 #9083824 for sale

LEICA / VISTEC MIS 200 is a mask and wafer inspection equipment designed to provide high-precision imaging capability. This system is used to inspect multi-layer structures in the fabrication of semiconductor components. It incorporates advanced synthetic imaging technology to give clear, detailed images which can quickly identify mistakes in the manufacturing process. The unit uses a high performance CCD imaging detector, which is able to capture ultraviolet (UV) and visible light for enhanced imaging capability. This results in clear, high-quality images that can quickly detect non-homogeneous patterns in the device structure. It features a variety of inspection modes which allow it to identify even the smallest defects, including minute particles like dust, cracks, etc. These can be quickly identified, allowing users to immediately rectify errors in the device. A high-resolution imaging lens provides a wider field of view, allowing the machine to inspect a large area of the device. This makes it possible to easily identify any errors in the structure, allowing for faster troubleshooting. The tool also utilizes an advanced clustering algorithm to detect small particles which may not be visible to the naked eye. LEICA MIS 200 also uses a variety of configurations which allow it to inspect various shapes and sizes of devices. This allows users to quickly identify which configuration is best suited for the particular device in question. Additionally, the asset features automatic focusing and auto-exposure algorithms, which ensure images are always crisp and clear. The model is built for reliability and durability, ensuring that it lasts for a long time and giving users peace of mind. Its robust construction ensures reliable service even in harsh environments. All of these features make VISTEC MIS 200 the perfect solution for inspecting multi-layer structures in the fabrication of semiconductor components.