Used LEICA / VISTEC MIS 200 #9137335 for sale

LEICA / VISTEC MIS 200 Mask and Wafer Inspection Equipment is the ideal solution for inspecting, verifying, and correcting defects on photomasks and wafer products. This system provides a high accuracy of imaging, defect detection, and correction to allow for better product performance and yield. The technology behind LEICA MIS 200 unit is a unique combination of multi-layer optics, optimized numerical imaging algorithms, and basic physics. The machine utilizes through-the-lens optics and advanced light scattering techniques to create a high-resolution image of defect sites, allowing the tool to detect and classify defective sites quickly and accurately. The imaging process also captures the full width of defects by using a stringent defect coherence algorithm to accurately determine defect size and shape. VISTEC MIS 200 has an open architecture for enhanced flexibility, allowing for upgrades and integration with other existing software and hardware. This asset also features an efficient user interface for quick and easy mask and wafer inspection set-ups, as well as a powerful, automated defect analysis and correction tool. The model can detect many different types of defects and aberrations, including particle defects, cracks, scratches, incomplete absorber layers, and other common faults. In addition, it can detect multilayer mask defects in up to 9 layers. This equipment also allows users to quickly analyze defect information to make prompt corrections, eliminating the need to run or re-run additional test processes. MIS 200 Mask and Wafer Inspection System is an effective, efficient way to improve the accuracy of production masks and wafers. With its innovative optical unit, powerful automated tools, and robust design, this machine provides the ideal solution for manufacturers looking to boost the productivity and reliability of their products.