Used LEICA / VISTEC MIS 200 #9177359 for sale

LEICA / VISTEC MIS 200 is a mask and wafer inspection equipment used in semiconductor manufacturing that is unsurpassed for its reliability and accuracy. This leading-edge system provides users with the most detailed inspection capabilities available, setting a new standard for quality control. The unit is capable of taking into account wafer topography, probing at the nanometer scale, and a range of parametric measurements to detect the presence of potentially tiny defects. LEICA MIS 200 has the ability to inspect multiple die, with measurement capabilities up to 15 times faster than comparable systems. Additionally, users can control the exact parameters and components being measured, such as layer patterns, transistors, vias, and other high-density circuit structures, with ease. Accurate alignment can also be quickly achieved, regardless of wafer topography. This results in minimized mis-reading outliers, of up to 10.5 μm which is considerably below traditional systems. The machine is composed of a stereomicroscope microscope and a motorized XY stage attached to a PC-based image capture tool. This combines with patented telecentric optics to create a focused image of the wafer or mask. The asset also has several high-tech features, such as automated measurements that use proprietary algorithms for feature detection and identification. This allows users to quickly locate and measure components. It also includes an intuitive software interface that allows users to fine-tune parameters with ease and precision. VISTEC MIS 200 is a powerful and efficient inspection model that can provide the utmost level of accuracy and reliability. The equipment can be used to make sure that the highest quality mask and wafer products are being produced and make sure any defects present are quickly located and addressed. This system is essential to ensure that semiconductor devices meet the tightest manufacturing requirements.