Used LEICA / VISTEC MIS 200 #9250501 for sale

LEICA / VISTEC MIS 200 is a Mask and Wafer Inspection Equipment, capable of inspecting and characterizing masks and wafers with a high degree of accuracy, speed, and consistency. It is much more accurate than conventional inspection methods and allows for faster detection of defects. LEICA MIS 200 utilizes a confocal optical system to maximize its precision and accuracy. The confocal optics consists of an objective lens with an adjustable slit, and a collection lens with a fixed aperture. The optics allow for a focused beam of light to pass through the mask or wafer, which is then scanned using galvanometer scanners and a 2-axis galvanometer mounted mirror unit. This allows the beam of light to be focused and accurately directed over the various features of the mask or wafer. The primary benefit of VISTEC MIS 200 is its ability to accurately locate defects in the micro and nano scale ranges, with an accuracy of less than 2nm. In addition, it can identify and measure local geometries and features, such as corners, edges, and angles, with a high degree of accuracy. In addition, it can be used to measure CD (CD), linewidths, and other parameters with a high degree of accuracy. Furthermore, MIS 200 is equipped with a high-speed imaging algorithm and a highly sensitive photodetector, which allows for maximum detection efficiency. The machine can detect non-reflective surface topology, such as Void and Void Gaps, and can identify particles in weakly reflective areas. SUMMARYLEICA / VISTEC MIS 200 is a Mask and Wafer Inspection Tool, capable of inspecting and characterizing masks and wafers with a high degree of accuracy, speed, and consistency. It makes use of a confocal optical asset to maximize its precision and accuracy and to detect various features, such as corners, edges, and angles, with a high degree of accuracy. In addition, it can detect non-reflective surface topology, such as Void and Void Gaps, and can identify particles in weakly reflective areas. It is also capable of measuring CD (CD), linewidths, and other parameters with a high degree of accuracy.