Used LEITZ MPV-CD2 #293749265 for sale

LEITZ MPV-CD2 is a microscope-based mask and wafer inspection equipment for both 1X and 5X steppers and scanners. The system consists of three optical components: an interference microscope, an image detector and a micrometer head. The interference microscope is used to capture images of the mask and wafer during the inspection process. It has an objective lens with a numerical aperture of 0.34 and a 1/2″ sensor. It also has digital focus lock, which allows for a continuous focus regardless of mask or wafer motion. The image detector is a Charged Couple Device (CCD) with 2,048 x 2,048 pixels and 12-bit digitization. It is capable of producing a full 25µm image from a 3-µm field of view. It also has a variable gain of up to 10,000x to maximize image detail. The micrometer head is used for pinpoint accuracy during the inspection process. It is mounted on a four-axis rotating stage with a 25µm accuracy to ensure 100% accuracy in each and every inspection. MPV-CD2 is also equipped with a variety of user-friendly features. It includes an interface that allows for direct communication with third-party applications; a process monitoring unit to log the results of each inspection; and an interferometric red-light protection machine to ensure maximum image quality. LEITZ MPV-CD2 is both easy to use and highly accurate, making it the ideal solution for mask and wafer inspection. From small to large image defects, the features of MPV-CD2 provide the user with the confidence that each and every inspection is accurate and reliable.