Used MCBAIN SYSTEMS DDR-300 NIR #9124645 for sale

MCBAIN SYSTEMS DDR-300 NIR is a mask and wafer inspection equipment that offers advanced, non-destructive wafer and mask inspection capabilities from one easy-to-use platform. This system is designed for efficient and reliable characterization of imaging devices, including complex color filter arrays, transparent conductive oxides, and multi-layer backplanes. DDR-300 NIR utilizes high-definition direct imaging and speckle imaging algorithms to deliver accurate and reliable performance. The platform is equipped with high-resolution optoelectronics, UV-Vis-NIR detectors, and high-speed cameras with high-speed proprietary data processing capabilities. The unit also features multi-dimensional microscopy, which enables rapid rough and fine focus scanning. With its advanced intensity features, MCBAIN SYSTEMS DDR-300 NIR can reliably detect and measure wafer and mask defects, enabling users to quickly identify reliable die areas on the materials. Meanwhile, the advanced chipset computing capabilities of the machine make it ideal for monitoring mask and wafer manufacturing processes. Through its advanced software algorithm, DDR-300 NIR is better able to detect defects for even greater accuracy and efficiency. It also boasts a low-light imaging tool to accurately draw wafer and mask outlines, plus a high-dynamic range imaging asset for detailed inspection and mapping of patterned yellow materials and complex backplane structures. MCBAIN SYSTEMS DDR-300 NIR is also easy to set up and requires minimal maintenance, making it ideal for busy manufacturing and research facilities. In addition, the platform can be integrated with the customer's existing measurement or automation equipment to facilitate the collection of data across the entire process chain. With its advanced features and reliable performance, DDR-300 NIR is the perfect tool for precise wafer and mask inspection.