Used MEISHO NM-0402 #9078486 for sale

MEISHO NM-0402 is a mask and wafer inspection equipment designed for maximum efficiency and performance. It features an advanced optical system and sensor head configuration that provides high resolution images for pixel level comparison and defect detection. The unit is also capable of automated analysis of optical patterns for complex defects. The optical machine includes a pair of front telecentric objectives mounted on a vertical linear drive, with a built-in focus servo, that continuously adjust the focus of the optics to keep the image sharp and consistent. The lens tool offer a wide field of view with a maximum resolution of 4.5µm with a 1x field covering an area of 10 x 10cm. The asset also features a variable wavelength range, from 400 to 1100 nm, for a wide variety of applications. NM-0402 is equipped with light sources for bright field, darkfield, and optical contrast imaging applications. Additionally, it is capable of high speed scanning at up to 4k x 4K pixels and has precise control of scan rate and exposure parameters for faster inspection times. MEISHO NM-0402 incorporates a sophisticated image processing model with pattern recognition and defect detection capabilities. It is able to detect defects ranging from wide-area non-uniformity and contamination to line/edge defects and particles down to 10nm. It also features an internal database for storing and managing image data. NM-0402 can be used for wafer inspection, defect detection of wafer patterns, optical quality and contamination, and inspection and metrology of masks. It is also compatible with multiple data formats, making it easy to integrate into existing systems. In summary, MEISHO NM-0402 is an efficient and powerful mask and wafer inspection equipment equipped with advanced optics, a sophisticated image processing system, and a database management unit. It can be used for a wide range of applications and is easy to integrate into existing systems.