Used METRICON 2010/M #80299 for sale

METRICON 2010/M
ID: 80299
Prism Coupler Prism Laser: 635nm Dell Optiplex PC: 2GB RAM, 250GB hard disk, 16X DVD-ROM, 19" LCD monitor, Windows7 Compatible with XP/Vista/7 with a serial interface box 2010-NSW-1550: provides operation at additional wavelength of 1550 nm Options: (1) or (2) TM Option for laser(s).
METRICON 2010/M Mask and Wafer Inspection equipment is an automated, high-precision optical inspection and measurement tool utilized for the critical production of integrated circuits. The system combines three specialized instruments in an integrated unit that are used for inspection and measurements of mask and wafer materials. This allows for evaluation of wafer features through automated visualization, flexible test and pass/fail classification. METRICON 2010/M consists of an XY stage for Wafer defect inspection, and two optical instruments for measuring mask shapes and contours. The XY stage drives a two dimensional scanning platform, allowing the machine to capture both top-view and cross-section images of the mask or wafer. The optical instruments include a scatterometer, which is used to measure the optical scattering properties of masks, as well as a scanning electron microscope (SEM). The SEM is used to analyze the structure and characteristics of masks, providing high-resolution images that are well-suited for 3D imaging. In addition to these two instruments, METRICON 2010/M tool also includes a 3D stage which is used to acquire measurements of the height and shape of masks or wafers. This is done by utilizing a laser beam, which scans the surface and is used to construct a 3D image of the object in question. Finally, METRICON 2010/M asset also includes a number of software components, which are used to automate the workflow of acquiring data for analysis. The software includes statistical models, which allows for rapid analysis of the data, and a data mining module for extracting information from the large volume of data acquired for the inspection process. METRICON 2010/M model is a powerful tool for mask and wafer inspections, providing high precision and accuracy when evaluating features. Utilizing these tools, shorter test cycle times and improved cost effectiveness can be achieved when compared to manual inspection methods. The equipment is used by leading semiconductor companies in the production of integrated circuits, both for quality control and process monitoring.
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