Used METRICON 2010 #9246090 for sale
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ID: 9246090
Prism coupler
Reflective index: Single / Dual thin film layers
Measurement accuracy and resolution:
Index accuracy: ± .001
Thickness accuracy: ± (0.5% + 50 A)
Index resolution: ± .0005
Thickness resolution: ±0.3%
Refractive index measuring range:
Films and bulk materials with refractive index: 2.45
Films with index up to 2.70 (Depending on film thickness)
Typical measurement time:
10-25 Seconds with standard table
15-75 Seconds with high resolution table
Index measurement of bulk materials / thick films:
Accuracy: ± .001
Resolution: ± .0005
Bulk measurement: 5-20 Seconds
Operating wavelength:
Low power: 0.5mW
He-Ne Laser: 632.8nm
CDRH / BRH Class II
Substrate materials:
Silicon
GaAs
Glass
Quartz
Sapphire
GGG
Lithium niobate
Substrate size: Up to 150 mm²
Prism types / Index range:
200-P-1 / <1.80
200-P-2 / 1.70-2.45
200-P-3 / <2.10
200-P-4 / <2.02
Rotary table step size:
3.0 or 1.5 min
High resolution tables: 0.9/0.45 or 0.6/0.3 min
No-charge option.
METRICON 2010 is a state-of-the-art automated Mask and Wafer Inspection equipment designed to meet the highest standards in semiconductor inspection. This system uses advanced pattern-matching and optical microscopy technology to discover and classify mask defects and wafer contamination with unmatched accuracy. Using advanced algorithms, 2010 is able to scan a wafer with highly accurate resolution, allowing it to detect defects down to 1/100 of a micron. Proprietary lighting solutions are also available to enable METRICON 2010 to accurately identify even the smallest of defects in any inspected wafer. The unit provides an effective detection rate for particles above 0.2um and submicron flaws up to 0.5um thanks to its 12MP camera technology. In addition to providing a tight focus over the entire wafer, 2010 also adheres to industry-standard cleanroom configurations, as well as advanced fault isolation features, which allow defective areas to be quickly identified and troubleshooted. This helps to ensure a high yield of on-spec parts along with increases in process efficiency. Other features of METRICON 2010 include high-speed scanning for whole mask inspection, and an intuitive GUI that allows for a visual representation of defect locations. By showing defect attributes such as size, shape, location and orientation, this adds a higher level of accuracy in defect classification. The automated and multi-functional nature of 2010 machine make it an ideal choice for high-throughput production, providing cost-effectiveness and improved efficiency throughout the mask and wafer inspection process. This advanced tool is designed to deliver superior accuracy and performance to help meet the challenges of today's fast-growing semiconductor industry.
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