Used METRICON 2010 #9383448 for sale

METRICON 2010 is a mask and wafer inspection equipment which is frequently used in semiconductor production, metrology and defect analysis. The system is capable of inspecting large substrates such as 200, 300, and 450 mm diameter wafers using a unique snap-shot tilted-tilted inspection technology which allows it to cover the entire wafer at once. The inspection unit includes an integrated matrix illumination module which provides illumination uniformity across the entire field of view. This enables the machine to detect defects with high sensitivity and in high quality. The inspection tool is composed of a high resolution camera, light source and optics, as well as a pattern recognition software. The pattern recognition software allows for the inspection asset to accurately identify and classify defects related to the pattern design rather than only focusing on defect localization. The software also provides for automatic pattern matching, as well as manual scanning options. 2010 also includes a comprehensive image processing package which can isolate geometry or defect regions from the background. This enables the model to analyze specific regions on the sample and to accurately identify defects that may otherwise be undetectable by the human eye. The image processing package includes several image manipulation tools such as binarization, smoothing and unsharp masking. The equipment itself is controlled by a highly advanced and intuitive graphical user interface (GUI). The GUI features user-friendly menus and simple drag-and-drop functionality, making it very easy to operate. Additionally, customizable templates and macros can be built to simplify repetitive task and allow the user to customize parameters such as inspection conditions, mask design rules and image processing techniques. Overall, METRICON 2010 is an advanced system equipped with sophisticated optics and image processing, automation and a friendly GUI. Its high-resolution camera, pattern recognition software and image processing package make it a powerful yet cost-effective inspection unit for mask and wafer applications.