Used MICRO ENGINEERING LM 320 #9085607 for sale

MICRO ENGINEERING LM 320 is an advanced mask and wafer inspection equipment developed for inspecting the most complex photomasks used for application-specific standard products (ASSPs) and the fabrication of large area ICs. The system is capable of capturing images of photomasks and wafers that can be used to detect small defects such as particles, contaminants, and missing metal, as well as surface irregularities that could lead to failure. The unit is equipped with a high-performance charge-coupled device (CCD) camera and advanced optics enabling accurate visual inspection with automatically generated optical parameters and optic field covering both wide field of view and micron-sized features. The machine is capable of detecting particles as small as 1.0 micron. It can identify features down to 0.4 micron and has a programmable minimum feature size of 1.2 micron. It also includes a motorized stage to enable faster scan rate and greater accuracy of inspection. The field of view of the tool can be adjusted to meet the required resolution while providing the best possible image. The asset runs on a Windows environment, making it easy to control with basic familiarity with the computer. The analysis software is also user friendly and can be set to run routine check and provide actionable feedback when needed. The model also includes a complete suite of mask and wafer evaluation applications such as overlay, warpage, reflectance and particle inspection. This makes it suitable for a wide range of inspection and metrology needs without having to purchase additional software. The software is one of the most advanced mask and wafer evaluation and inspection packages available on the market and provides extremely reliable data. The equipment has the ability to detect a wide range of defects from very small to very large, ensuring that any potential issues are identified and addressed quickly and accurately. LM 320 is a valuable tool for the development, manufacture and inspection of all types of photomasks and wafers. It is capable of quickly scanning and evaluating samples from the most complex masks and wafers, making it a reliable and effective solution for those involved in the assembly, inspection and manufacture of photomasks and wafers.