Used MICRO-EPSILON IF C2400 #135299 for sale

MICRO-EPSILON IF C2400 is an advanced mask and wafer inspection equipment developed by MICRO-EPSILON, a leading innovator in factory automation and industrial process measurement equipment. It is an automated Compact Inspection System that delivers superior inspection performance and quick return on investment. The unit features a dual lens design with variable zoom, an integrated laser and a powerful optical filter selection to enable inspection of small critical components and alignment of the field of view for wide-angle requirements. The machine is designed to inspect damaging defects on a silicon mask or wafer assemblies, such as fractures, scratches, and particle contamination. IF C2400 utilizes a stereo inspection platform that enables the capture of two-dimensional image data of each point on the face of the mask or wafer. This process is called monochrome imaging. The captured data is compared to a previously captured reference image data to detect any changes in the surface design and in the defects of the mask or wafer. The tool is capable of detecting abnormalities which are typically smaller than one micron or 1/1000th of a millimeter. The asset can be used to inspect a wide range of wafer and mask sizes from bumpers to memory cells and from square to rectangular. MICRO-EPSILON IF C2400 offers both automatic and manual alignment of the field of view to ensure flexibility for each application. Both dynamic and static inspection capabilities are supported. The model also features a wide range of operating parameters that can be adjusted for maximum performance and accuracy. IF C2400 includes automated test procedures, image capture and comparison, result documentation and statistical analysis. The intuitive Windows-based software allows the user to focus on product development and engineering objectives. To ensure the highest level of accuracy and performance, MICRO-EPSILON IF C2400 incorporates a series of sophisticated optical and mechanical components such as adaptive optics, dynamic contrast stabilization and a high-resolution sensor array. The equipment also offers an enhanced level of environmental protection due to its air filtration system, temperature regulation, and power isolation. Last, but not least, the unit is fast and affordable, making it an excellent solution for mask and wafer inspection requirements.