Used MICRO-METRIC MicroLine ML420 #9266732 for sale

MICRO-METRIC MicroLine ML420 Mask & Wafer Inspection equipment is designed to meet the increasingly stringent requirements of semiconductor fabrication processes. It utilizes advanced optical technologies and metrology techniques to analyze the integrity of semiconductor devices. The ML420 is capable of inspecting high-density, multi-level patterns, circuit structures, sub-micron features, and defect formation at depths of up to two microns. The system features an automated stage that can scan and inspect up to a 250mm wafer at speeds of up to 4K scans/second. The ML420 is also equipped with a unique Spin Scan feature that can rotate wafers during inspection with selected areas of interest/defect highlighted. This allows for a more in depth look at each feature. Furthermore, the unit includes an automated Focus Per View (FPV) module that adjusts the image fields while scanning to compensate for wafer surface topography, providing higher precision and accuracy. The ML420 also has a powerful Light Path Process (LPP) algorithm that detects patterns and defects based on statistical criteria, minimizing the need for manual data validation by users. The ML420 also contains built-in Image Quality Enhancement (IQE) algorithms. These algorithms automatically enhance the acquired images, which eliminates the need for manual adjustment of gain and offset values, improving process repeatability. The machine can also be used for a wide range of applications such as Resist Imaging, Sub- Pixel Edge Detection, and Cross-Line Measurements Inspection due to its robust optimization features and configurable operating parameters. The ML420 also includes an integrated defect management tool and provides an automated workflow for defect isolation, characterization, detection, classification, and flagging. This helps to reduce inspection time andensures that no critical defects are missed. Furthermore, the asset also features data logging, reporting, and remote diagnostics capabilities to help users troubleshoot issues in real time. The advanced features of MicroLine ML420 Mask & Wafer Inspection model make it a formidable solution for semiconductor devices. It provides reliable and effective results for inspection of high-density, sub-micron structures and complex circuits that can result in improved yields and increased process control. This makes the ML420 a top choice for organizations looking for advanced optical inspection solutions.