Used MOLECULAR IMPRINTS Imprio 55 SFIL #9037906 for sale

MOLECULAR IMPRINTS Imprio 55 SFIL is a mask and wafer inspection equipment that uses scanning electron microscopy (SEM) to provide sub-micron level defect-detection precision. It is designed to inspect pre-patterned and device mask layers on both rigid and elastically deformable substrates. The system offers automated, non-destructive imaging with unparalleled resolution at a wafer-level, allowing for defects to be accurately identified and characterized in both traditional imaging and spectroscopic modes. The Imprio 55 includes a high-energy SEM electron source that is capable of producing beam energies up to 6 keV. This provides higher sensitivity for a variety of defect-related analysis while reducing the overall particles/spot size. The pixel rate of the Imprio 55 is up to 1.2 million per second, allowing for quick accumulation of images and data in both surface and cross-sectional modes. The Imprio 55's advanced optics and imaging capabilities distinguish it from other mask and wafer inspection systems. For example, it offers highly advanced virtual, low-noise imaging which utilizes multiple monochromatic electron sources with enhanced polarization. This gives it an excellent resolution and more accurate contrast for pinpointing defects, regardless of their size or location on the wafer. In addition, the Imprio 55's unique scan control feature enables users to configure their unit for either single-site or multiple-site inspections. This eliminates the need for manual adjustments to achieve the desired imaging and defect detection capabilities. The Imprio also includes automated pattern recognition techniques, which enables cleaner, faster imaging in comparison to manual techniques. Combined with its remote control capability, the Imprio 55 enables users to monitor operations while away from the machine. It also has automated process monitoring, which can be used for production line oversight and process control. Finally, the tool comes with a range of powerful software tools and capabilities, including 3D image analysis, histogram analysis, and feature recognition. Imprio 55 SFIL from MOLECULAR IMPRINTS is a reliable and powerful mask and wafer inspection asset designed to detect and characterize sub-micron level defects with high precision. Its advanced imaging components and automated features make it an ideal tool for production line monitoring, process control, and defect analysis on both traditional and deformable substrates.