Used MOLECULAR IMPRINTS Imprio 55 #293590454 for sale

MOLECULAR IMPRINTS Imprio 55 is a comprehensive mask & wafer inspection equipment specifically designed to provide maximum operator flexibility during the semiconductor fabrication process. The system offers fast, accurate and repeatable measurements of critical feature sizes, as well as layer and critical overlay properties, across the entire range of substrate materials. Imprio 55 is composed of a high-resolution optical wafer-imaging subsystem with a top-mounted mounted mask inspection head which allows for simultaneous viewing of both the top and bottom mask surfaces. The imaging subsystem features five optical channels, including laser diode and Moire phase-shift, providing optimized imaging with a proprietary image processing architecture to quickly and accurately detect defects. The unit also offers circular polarized light inspection for isotropic surface inspections. In addition to its optical imaging capabilities, MOLECULAR IMPRINTS Imprio 55 is designed with a powerful in-situ sample loading and positioning machine, allowing for rapid wafer positioning and inspection of up to 12 masks in unattended operation. A central control console, with an intuitive graphic user interface and support for a variety of data analysis tools, gives users access to pre-defined inspection profiles and the ability to customize customized setup and analysis parameters. Multiple overlay modes provide the flexibility to inspect a variety of alignment specifications with the help of a precision 2-axis stage. Imprio 55 also provides an integrated metrology package with a range of advanced measurement solutions including CD, critical dimension, coordinates and line width measurements along with overlay position, flat top/bottom and overlay high-contrast results. Additionally, it supports several high-end statistical process control modes, analyses and reports specific to process control, including full registration. In short, MOLECULAR IMPRINTS Imprio 55 mask & wafer inspection tool from MOLECULAR IMPRINTS is designed to provide the flexibility, accuracy and repeatability needed for semiconductor fabrication. Its high-resolution optical asset, automated wafer loading and positioning, refined image processing and integrated metrology capabilities enable the model to perform advanced inspection and analysis of masks and wafers quickly and reliably, helping minimize production time and costs.