Used NANOMETRICS 200 #9226184 for sale

NANOMETRICS 200 is a state-of-the-art mask and wafer inspection equipment that offers high precision 3D metrology and defect resolution capabilities. It is used to detect both surface and subsurface defects in semiconductor devices and materials. 200 combines advanced nanoscale imaging technologies with comprehensive image processing algorithms. The system offers a variety of measurement modes for both mask and wafer inspection, and can even be configured to measure the shape of the edge of the mask or wafer. The unit consists of a hardware unit which contains an array of high resolution lenses, a scan head, an image capture device, and a motorized stage machine which controls stage position and motion. The hardware unit is connected to a computer which provides the user interface, image processing algorithms, and other functions. The software suite includes a variety of tools for inspecting masks and wafers, such as defect tracking, statistical process control, advanced surface reconstruction, and process optimization. NANOMETRICS 200 utilizes a variety of imaging techniques for a variety of applications. These imaging techniques include reticle focusing imaging (RFI), high resolution imaging (HRI), patterned light imaging (PLI), area array imaging (AAI), and electron beam imaging (EBI). These techniques help to ensure that all surface and subsurface defects are accurately and reliably detected. In addition to its precision mask and wafer inspection capabilities, 200 can be used to measure shape features, resolve dimension related process problems, and detect even the smallest of process-induced defects. The tool is also equipped with an automated defect classification and sorting capability, making it easier to pinpoint and distinguish between different defect types. NANOMETRICS 200 is capable of scanning and measuring large areas, enabling it to handle multiple mask and wafer inspection tasks with ease. Its advanced analysis algorithms can detect even the most minute of defects, ensuring that customers receive accurate results. Its reliable operation, combined with its intuitive user interface, makes it a great choice for mask and wafer inspection tasks.