Used NANOMETRICS 210 #9160092 for sale
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ID: 9160092
Thin film thickness measurement system, 4"
Range of thicknesses: 100 to 500,000 angstroms
Spot size:
50 um with 5x objective
25 um with 10x objective
6.5 um with 40x objective
Olympus M10x and M40x objective
Optional objectives are Olympus M5X and M100X
Film types:
Oxide on silicon
Nitride on silicon
Negative resist on silicon
Polysilicon on oxide
Negative resist on oxide
Nitride on oxide
Polyimide on silicon
Positive resist on silicon
Positive resist on oxide
Reflectance mode
Thick films reproducibility: 5A ± 5% depend
Typical measurement time: 2.5 seconds.
NANOMETRICS 210 Mask & Wafer Inspection Equipment is a revolutionary automated solution for reviewing the progress of semiconductor and other microelectronic device fabrication processes. With its industry leading optics, automated motion stages and intuitive software, 210 gives users an incredibly detailed picture of their products, helping to ensure accuracy and facilitate quick decision making. NANOMETRICS 210 features a suite of tools and inspection capabilities, all backed by NANOMETRICS leading, highly accurate optical systems. This system can quickly detect and measure tiny variations in the features of a mask or wafer, such as pattern sizes and shape, line-widths & spacings, as well as the absence, presence, and position of features. In addition, 210 is also capable of inspecting other characteristics such as color, contrast, geometry continuity, and registration accuracy. With NANOMETRICS 210's wide range of resolution and calibration options, users have access to an incredibly comprehensive look into their wafers. The unit also offers a robust suite of software designed to simplify inspection processes for users. From project's start to finish, 210's purpose-built user interfaces are designed to enable intuitive operation. With automated features such as substrate handling, thermal stabilization, and automated scans, users have complete control over their projects. Additionally, NANOMETRICS 210 software provides analysis tools like graphing and trace functions, allowing users to make accurate assessments of the condition of their microelectronic devices. 210 is designed to facilitate the testing process while providing unprecedented accuracy and reliability. Its industry-leading optics and motion stages provide highly precise inspection capabilities, and its intuitive software enables users to efficiently manage their projects from start to finish. NANOMETRICS 210 is a must have machine for anyone in the microelectronics fabrication industry.
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