Used NANOMETRICS 565 094 329 #9242380 for sale

NANOMETRICS 565 094 329 mask and wafer inspection equipment is an advanced optical tool that enables photolithographers and yield engineers to detect defects at the nanometer resolution level. This enables them to identify microstructural flaws in the fabrication of semiconductors and other advanced micro-devices, ultimately leading to improved yields and faster time to market. The system is designed for use in the clean rooms of any advanced chip production facility, making use of the same environment that is used to run chip making processes. Within these clean rooms, NANOMETRICS mask and wafer inspection unit is deployed to identify any foreign object debris, or "FODs", that may have entered the work area in between layers of the design. In addition to FODs, the machine is also capable of detecting surface defects, misalignments, and other irregularities that may exist within the device. This is accomplished by using the nanometer resolution capability of the tool to inspect the device layer by layer in order to identify any such irregularities. The pattern matching algorithms used by the asset are able to recognize patterns that may indicate the presence of a defect. This also ensures the highest fidelity of the features being inspected. NANOMETRICS model also makes use of filters to view the sample image that is being inspected. These filters make use of ultraviolet light, visible light, infrared light, and other wavelengths to provide different levels of resolution in order to ensure defect detection. The equipment also includes a high quality image recording interface, allowing photolithography engineers to store images for close up inspection. These images can be stored, recalled, or shared among several members of the software engineering team. In addition to being able to detect defects at nanometer resolution, 565 094 329 also comes with several other features such as stage movement controls, auto measuring functions, multiple regions of interest, an intuitive user interface, and an easy to use hardware control. NANOMETRICS 565 094 329 mask and wafer inspection system is the premier tool for quality inspection and defect detection in the manufacturing of semiconductor and other micro-electronic devices. This unit has revolutionized the industry, and has allowed for higher yields and faster speeds to market.