Used NANOMETRICS 6100X #9157662 for sale

NANOMETRICS 6100X Mask and Wafer Inspection equipment is a high-performance and versatile imaging solution for testing and inspecting photomasks and wafers. It is an aberration-free imaging system that offers unmatched level of resolution and accuracy. It provides a 4k optics resolution with more than one trillion pixels at the imaging sensor. NANOMETRICS 6100 X Mask and Wafer Inspection unit utilizes state-of-the-art image processing technology to achieve the highest level of image analysis and pattern recognition. It provides high-depth of field and optimal dynamic range for a wide range of imaging applications. It also features an advanced illumination machine which includes a mix of brightfield, darkfield, oblique and polarized illumination. This illumination tool can be combined with laser scanning metrology, low noise detectors, and high-resolution imaging to create an ideal and versatile imaging solution. 6100X Mask and Wafer Inspection asset provides better focus for higher-resolution images across a large field of view. With the ability to image repeating patterns, it can be used to inspect multilayer, multi-level, and complex patterned structures. The model also features an advanced auto-learn function which can reduce defects and improve the accuracy of images. 6100 X Mask and Wafer Inspection equipment has an intuitive user interface and powerful image analysis capabilities. It can be tailored to include an entire wafer analysis along with statistical process control (SPC) algorithms for exacting pattern analysis. This combination of high-performance optics, imaging, and image processing technology ensures the highest yield possible and reliable process control. NANOMETRICS 6100X Mask and Wafer Inspection System is an imaging solution with a perfect combination of intuitive user interface, advanced image processing, and high-performance optics. It is an ideal unit for characterization and inspection of photomasks and wafers in semiconductor device production. This machine can be used to detect and analyze complex structures with higher depth of field and higher resolution images, while still providing reliable and accurate results for process control.