Used NANOMETRICS 8000 #9284335 for sale

NANOMETRICS 8000 is a cutting edge metrology tool used for semiconductor wafer and mask inspection. The equipment is designed to provide accurate 2D data for both wafers and masks, allowing users to make critical decisions on material quality and composition. The system is based around an innovative laser microscope with advanced imaging and analysis capabilities. 8000 is an automated wafer inspection microphone based on CCD (charge-coupled device) technology, combining scanning laser microscopy with fringe projection. Laser technology is used to acquire high-resolution images of wafers and its microlithographic masks. The camera features two independent laser sources, one provides high-definition imaging for the samples, while the second is optimized for edge detection. The imaging systems can operate in a range of resolutions from nanometer to micrometer, depending on the need and environment. Additionally, the unit is also able to detect and monitor surface defects and wear on masks and wafers. The powerful imaging capabilities of NANOMETRICS 8000 make it a valuable tool for process control as well as quality control. The machine can provide powerful feedback on the correctness of the manufacturing process. For instance, by monitoring the electrical characteristics such as tungsten line width and defect detection it is possible to detect errors before they reach the final product and save costs in the manufacturing process. 8000 provides a complete environment for 2d mapping and characterization of masks and wafers. The tool includes high end data acquisition and analysis hardware and software with powerful image processing tools. These tools enable precise surface measurements, detailed comparative analysis between samples, astigmatic detection, uniformity issues, particles sizes, and other material properties, enabling users to make informed decisions when assessing material quality. In conclusion, NANOMETRICS 8000 is a high-performance inspection asset for wafers and masks. By leveraging advanced laser technology it provides powerful imaging results, allowing users to make accurate and informed decisions on those materials. The model also features enhanced imaging and analysis capabilities, making it a valuable tool for process control and quality control.