Used NANOMETRICS 8000XSE #293743932 for sale

NANOMETRICS 8000XSE is a mask and wafer inspection equipment designed to provide high-precision nanometer-scale imaging and measurement capabilities. The system utilizes in-pixel binning, big pixel binning, splitting, and super-sampling techniques to achieve unprecedented data accuracy. It is equipped with advanced automated calibration and an easy-to-use graphical user interface, allowing for fast and accurate image analysis. The unit consists of an optical module, a z-stage and a scan head with an integrated telecentric lens. The optical module is capable of delivering high-resolution imaging from a few nanometers to hundreds of nanometers, depending on the application. The scan head is constructed from a rotatable axis and a linear axis, providing a submicron level of accuracy for imaging, measurement, and control. Additionally, the z-stage provides the platform for accurate recognition and analysis of fine features. NANOMETRICS 8000 XSE allows for the non-contact measurement of patterned structures on a wide variety of substrates. This machine allows defect measurement down to a sub-10 nm range when utilizing fine image resolution. When integrated with a surface profiler, the tool can also provide detailed surface information on wide structures and offers better signal-to-noise ratios. The asset is capable of several nanometer-scale inspection and measurement applications. This includes pattern recognition, optical inspection, overlay or registration, x-ray diffraction (XRD) or electron microscopy (EM), and other metrology and inspection tasks. In addition, it can automate the acquisition and analysis of pattern features, allowing for efficient and cost-effective nano-scale inspection. This model can also be used for particle size measurements and chemical analysis. 8000XSE also allows for large-field imaging and measurement. With this equipment, users can inspect an entire wafer without sacrificing the accuracy and resolution of individual features. Additionally, its imaging software supports analysis of 3D models, including measurements from cross-section images, allowing for deeper insights into pattern details. Furthermore, the data from this system can be imported to computer-aided design (CAD) programs. Overall, 8000 XSE is a highly advanced and reliable mask and wafer inspection unit that offers a range of inspection, measurement, and analysis capabilities. This machine enables non-contact nanometer-scale inspection and efficient automated analysis capabilities that are critical for advanced research and industrial applications.