Used NANOMETRICS 8000XSE #9228097 for sale

NANOMETRICS 8000XSE is a state-of-the-art mask and wafer inspection equipment that is designed to detect and identify a host of patterning and wafer defects. The system uses advanced metrology and imaging technologies to produce high resolution images of masks and wafers. The unit is capable of detecting pattern discontinuities, pattern gapping, and omissions, as well as line edge, line width, and sidewall angle variations in the mask and wafer. Additionally, it can detect defects such as contamination, defects, and failed polish. NANOMETRICS 8000 XSE consists of an inspection platform, a data analysis module, and a precision optics stage. The inspection platform consists of an imaging machine with a 6" fixed field of view that can zoom up to 0.4µm resolution. The optics stage includes an auto-focus tool, which allows for the scanning of the entire wafer for defects. This asset can be controlled remotely with a user-friendly graphical user interface. The data analysis module includes proprietary algorithms to detect, classify and quantify the defects, and provide visual representations of these issues. 8000XSE utilizes a range of technologies to detect, classify and quantify defects. These technologies include spectral reflectometry, color filter imaging, and spatial resolution imaging. These analysis techniques allow for the detection of defects as small as 0.2µm width. Additionally, the model is capable of scanning the entire wafer in one operation and can cover a field area of up to 200mm². 8000 XSE also includes a high-speed memory card that can store up to 1000 images for review later. NANOMETRICS 8000XSE is an invaluable tool in the fabrication of masks and wafers. The equipment offers a range of high-resolution imaging capabilities to quickly and accurately detect a wide range of defects. This system is designed to provide maximum productivity and quality assurance while minimizing the cost of production.