Used NANOMETRICS 8000XSE #9389858 for sale

NANOMETRICS 8000XSE Mask and Wafer Inspection Equipment is a cost-effective, highly accurate platform designed for the inspection and analysis of semiconductor masks and wafers. It is equipped with cutting-edge spectral-domain imaging technology, previously only available on much more expensive systems. This enables high-resolution, real-time imaging of line and space defects on mask and wafer surfaces, such as particles, scratches, and structural anomalies. NANOMETRICS 8000 XSE is designed for both production and R&D needs. It is equipped with powerful, easy-to-use software for fast, analysis and reporting. It also provides an array of advanced image-correction features, enabling accurate analysis of images despite lighting irregularities or other anomalies throughout the inspection process. 8000XSE features a two-rail configuration which enables scanning of both mask and wafer surfaces simultaneously. Two sets of vacuum chucks, one for mask and one for wafer, ensure images are accurately aligned to allow for accurate comparisons of mask and wafer conditions. The system's optical unit contains a polarized beam scanner that illuminates the object surface at three wavelengths. There are two panchromatic detectors, a VGA and a CCD, used for imaging. Each detector provides a different resolution, which can be combined to provide the highest resolution image. The computations and algorithms used by the machine to ensure high accuracy are performed using a FPGA-based image processor integrated with a GPU coprocessor. This ensures fast processing speeds and highly accurate image analysis results. The tool also features an ergonomic, user-friendly design, with a lightweight, compact form factor and a user-replaceable filter wheel for easy calibration. 8000 XSE is battery operated and packaged in a small, transportable case. Overall, NANOMETRICS 8000XSE Mask and Wafer Inspection Asset is an advanced, highly accurate solution for both production and R&D needs. It is capable of providing accurate, real-time images of mask and wafer surfaces in a lightweight, easy-to-use package.