Used NANOMETRICS 9010 #293590700 for sale

NANOMETRICS 9010 Mask & Wafer Inspection Equipment is an automated inline optical inspection system that provides the ability to measure, characterize and classify various defects on wafer patterns. It is used to detect and classify various prints, defects and masks during the manufacturing of semiconductor integrated circuits. The unit is based on the principle of optical imaging and utilizes high-resolution imaging methods to enable a higher level of accuracy and repeatability. The machine consists of several high performance optical systems that enable it to capture and analyze images of wafers and masks in a non-destructive manner. It comes with a high resolution monochrome CCD camera for imaging and a built in software for inspections and measurements. All of the components are integrated together on a precision platform which allows for accurate and repeatable results. The tool features a large working area to measure large masks and wafers, with a maximum field of view of up to 180mm x 180mm. The asset utilizes its high performance stereo microscopes, that possess a 10x/0.25NA, a 40x/0.5NA, and a 90x/1.1NA. 9010 Mask & Wafer Inspection Model is capable of providing high-level results of various types of wafer patterns and masks. It can detect and classify defects on a variety of materials including silicon, polymer, and organic substrates. The equipment has a built-in library of parameters and can be programmed to measure a variety of layout features including line width, pitch, and edges. It can also detect process-related errors such as overlapping, bridging, and stitching. Additionally, it is capable of automated stitching on inspection mask edges, sub-pixel stitching and post-stitching inspection via wildcard classes. This ensures that the mask which is seen by the wafer is valid and not containing any errors. The results of the inspections can be analyzed and stored in a variety of formats such as PDF, TIFF, and CSV. The user interface is simple and user-friendly and provides an easy way to view and analyze the data. The user is also able to customize the system settings in order to specify the type of defects they are interested in detecting. Overall, NANOMETRICS 9010 Mask & Wafer Inspection unit is a versatile and accurate tool used to detect and classify various wafer patterns and masks. With its simple user interface and ability to capture and analyze high resolution images, it is an invaluable tool for the semiconductor industry.