Used NANOMETRICS 9010 #9358223 for sale

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ID: 9358223
Wafer Size: 12"
Vintage: 2008
Thickness measurement systems, 12" No manual 2008 vintage.
NANOMETRICS 9010 mask and wafer inspection equipment is a high-quality, robust system designed for process control and defect detection in the semiconductor industry. It uses a specific set of integrated technologies and high-definition cameras to detect defects on substrates, with the addition of extended optics for additional accuracy. The unit has advanced optics, which provide a clear and consistent image throughout the inspection range. This ensures a clear, pixel-accurate image for a wide variety of substrate sizes and types, including wafers, patterns, chips, packages, and die devices. It can also handle reflective material to identify defects and resistive materials for particle detection. 9010 can detect suspended and non-suspended particles as small as 10nm. The unit also has multiple analysis tools and advanced pattern recognition. The multi-layer analysis and scan-by-scan inspection functions allow for quick and accurate defect detection. It can also detect texture and surface profile, as well as printability. Furthermore, it features a high-speed vision-based inspection machine, which is capable of fully automated inspection of even the most complex patterns or features. In addition, the tool includes a fully automated multi-function measurement tool which enables users to quickly measure critical process parameters, such as line width, barrier width, edge solution height, and area. This allows for tighter process control and provides users with greater confidence. NANOMETRICS 9010 also features automated defect classification, clustering, and prioritization. It can tag defects according to parmeter specifications and can also alert users to any potential brittle fails. Furthermore, it has a unique feature of measurement catacombs, which allows users to measure small features such as bumps and vias. 9010 is a powerful and accurate mask and wafer inspection asset which offers more precise defect detection, multi-function measurement, automated defect classification, and automated tagging. Its extended optics, HD cameras, and multiple analysis tools provide more accurate results and faster results. Combined, these features make NANOMETRICS 9010 a great choice for process control and defect inspection applications.
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