Used NANOMETRICS 9010B #293680907 for sale

NANOMETRICS 9010B mask and wafer inspection equipment is a high-performance automated metrology instrument capable of inspecting a variety of wafer and mask structures. The system utilizes a series of automated optical devices, including a scanning electron microscope, an electron beam lithography unit, and a sample positioning stage, for precise nanoscale measurements and feature alignment. By integrating multiple optical instruments and technologies, 9010B can accurately measure and characterize features on wafer structures and masks. NANOMETRICS 9010B's electron beam lithography machine has a beam spot size of 0.1 μm for highly accurate sample examination. This tool also has a 300 mm scan field of view to accurately measure complex nanometer level structures. Additionally, 9010B uses multiple x- and y-directional stages to precisely measure under-focused or off-geometry-aligned structures. The asset's scanning electron microscope (SEM) has a resolution of up to 0.3 nm, enabling users to accurately inspect feature sizes and locations. To power NANOMETRICS 9010B's highly advanced metrology capabilities, the instrument is powered by an integrated computer model. This is combined with a mechanical shutter equipment, which allows the user to configure the instrument's field of view and the accuracy of feature alignment. In addition, 9010B also has data capture and analysis capabilities to help users identify nanometer level defects on wafer and mask structures. NANOMETRICS 9010B mask and wafer inspection system is an excellent choice for inspecting a variety of nanoscale structures and feature locations. Its automated optical measuring capabilities enable users to acquire precise measurements and identify defects in complex structures. Its integrated computer unit and data capture capabilities provide users with complete analytical capabilities, helping to ensure the highest level of accuracy.