Used NANOMETRICS / BIO-RAD / ACCENT CDS 200 #9105488 for sale

NANOMETRICS / BIO-RAD / ACCENT CDS 200 is a high-performance, advanced mask and wafer inspection equipment designed to meet the most demanding mask and wafer inspection requirements of the semiconductor industry. The system is capable of inspecting masks with resolutions of 5 microns and wafer patterns with resolutions of 0.1 micron, and can provide up to 16x magnification for larger patterns. It features a high throughput of 720 images per hour, as well as an automatic image transfer unit for quick job setup and image processing. The machine is built on a Windows-based platform with a user-friendly graphical interface, allowing for a wide array of user-defined inspection parameters. It has the capability to detect common surface defects, such as particles, residue, and scratches, as well as structural defects, including missing and oversized objects. Additionally, the tool can be used to detect dark-field defects, such as micro-roughness and interconnect defects. ACCENT CDS 200 also implements a multi-channel setup and can be adapted to meet a variety of customer requirements, including automated visual inspection, automated surface inspection, automated 3D inspection, automated opto-electrical inspection, and automated die shear inspection. BIO-RAD CDS 200 features a fully integrated camera asset with high-definition imaging capabilities and an automatic image acquisition and stitching capability. Additionally, the model features a unique multi-directional pattern recognition algorithm that is capable of accurately detecting small defects. NANOMETRICS CDS 200 is capable of providing feedback on detected defects, allowing for accurate defect characterization and classification. The equipment also employs a state-of-the-art control scheme, ensuring that the inspected masks and wafers are produced with the highest quality standards. The system provides traceability and real-time review capabilities, as well as configurable workflow-driven features for easy operation. In addition, the unit ensures compliance with a variety of standards, including the SEMI D10 and SEMI F50 standards. CDS 200 also includes a full suite of software tools for image analysis and defect detection, allowing for the rapid diagnosis of defects. The machine is designed to meet high throughput and accuracy requirements in a variety of applications, including wafer and mask manufacture, photo defect detection, mask measurement and correction, and specialized product inspection.