Used NANOMETRICS / BIO-RAD / ACCENT Q200i #9390851 for sale

NANOMETRICS / BIO-RAD / ACCENT Q200i
ID: 9390851
Overlay measurement systems.
NANOMETRICS / BIO-RAD / ACCENT Q200i is a high-precision mask and wafer inspection equipment designed to inspect defect free masks and wafers up to 200 mm in diameter. This system provides superior imaging capabilities and the highest spatial resolution due to the advanced proprietary optical design employed. Furthermore, the unit is capable of sub-micron imaging with resolutions up to 0.7 microns in non-confocal imaging mode and 0.45 microns in confocal imaging mode with the confocal scan head. ACCENT Q200i has a number of high-resolution imaging tools designed for inspecting various types of mask features and wafers. These include; mask and contact aligners, wafer alignment, critical dimension measurement (CDM) tools, optical and electron-beam image magnification, and suspect device analysis to name a few. With the aid of an autofocus camera, this machine can take advantage of both optical and electron-beam imaging to capture micro-defects, while the built-in image analysis tool allows for fast accurate analysis of defects. The asset includes a sophisticated vision based defect review tool and a 10 megapixel CMOS camera that delivers an image processing engine capable of sub-pixel defect detection. The model also has built-in data integrity and comparison tools allowing users to maintain defect free wafers right up to production. This equipment can be integrated with other equipment such as laser scribes and film dicing systems to ensure accurate and repeatable defect detection. BIO-RAD Q200i has a number of cutting-edge features and benefits including a fully automated chassis, advanced image analysis, a user friendly software interface, real-time data viewing capabilities, and data logging, enabling users to easily navigate defect information from the masks and wafers to compare one job against another. Overall, NANOMETRICS Q200i is an excellent mask and wafer inspection system that provides unparalleled image analysis capabilities, accuracy and repeatability. With its fast accurate defect detection features, this unit is ideal for ensuring production of high quality defect free masks and wafers.
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