Used NANOMETRICS / BIO-RAD / ACCENT Q300 #9294760 for sale

NANOMETRICS / BIO-RAD / ACCENT Q300
ID: 9294760
Wafer Size: 12"
Vintage: 2002
Overlay inspection system, 12" 2002 vintage.
NANOMETRICS / BIO-RAD / ACCENT Q300 is a mask and wafer inspection equipment designed based on nanotechnology principles and the highest inspection standards. This system uses a two-beam non-contact laser scanner to collect reflective patterns of the semiconductor wafer surface for inspection. ACCENT Q300 has several features that make it ideal for mask and wafer inspection. It has a superior image resolution, which gives it exceptional resolution of 2.0 microns, allowing it to detect even the smallest defects. BIO-RAD Q300 is one of the few systems that measures the reflectivity of the wafer surface in real time, and can detect changes due to surface roughness or contamination. In addition, it has a large image capture area of 200 mm2, which allows for the recognition of feature sizes down to 10 nm. Q300 also uses a high powered laser light source which ensures a robust image capture even under challenging lighting conditions. Moreover, this unit is equipped with interchangeable lenses and filters tailored to the specific needs of inspections. The lens selection and light settings allow for a high level of accuracy and dependability, ensuring flawless results. NANOMETRICS Q300 is also designed for easy usage, as it is compatible with a wide range of masking techniques and wafer sizes. It provides a touchscreen interface which allows the user to control the whole process without the need of additional software. The machine also provides a web-based platform for easy device management and comprehensive real-time inspection data. All of these features make NANOMETRICS / BIO-RAD / ACCENT Q300 an ideal tool for mask and wafer inspection. It provides a high level of precision, image resolution and accuracy, and offers a simple user interface. With its combined powerful inspection features and comprehensive real-time data, ACCENT Q300 asset will enable users to optimize their wafer inspection process.
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