Used NANOMETRICS Caliper Elan #293625779 for sale

NANOMETRICS Caliper Elan is an advanced mask and wafer inspection equipment. It is designed to quickly test and monitor lithography process performance against various product design criteria. The system combines automated imaging, quick access database, powerful image analysis tools and advanced data analysis capabilities. It is used to analyze printability and surface topology of wafers and masks. It is designed to detect defects in the wafers quickly and accurately. The unit supports both high contrast imaging and multispectral imaging, making it ideal for monitoring any number of process variables such as line width, critical dimensions, overlay error and sidewall angle. It also offers high accuracy and precision in the measurements taken. The machine also includes a powerful Caliper software platform that integrates with various infrastructures. The platform enables users to set up, align and control tasks as well as visualize real-time data. In addition, it supports single- and multiple-pattern inspections, support for manual and automatic review, and compatibility with a wide range of image and mask formats. The tool can be automated with the help of a PreScan wafer and mask pre-scan wizard which allows users to determine the critical process parameters and the alignment required for the inspection. The Activa Alignment Asset in Caliper Elan helps users accurately align the mask to the wafer's active area. The model also supports simulation of the printing process which helps in detecting potential errors before beginning production. The equipment also offers powerful reporting features to generate reports in a variety of formats. This helps users track individual process performance as well as compare the process performance against previous results. Furthermore, the system allows users to monitor and analyze the process on a global and individual level. NANOMETRICS Caliper Elan mask and wafer inspection unit is designed to provide precise and accurate wafer and mask testing results. With its automated image processing, multi-spectral imaging capability, powerful reporting features and automated monitoring capabilities, it is an ideal tool for monitoring and improving the performance of lithography processes.