Used NANOMETRICS Caliper Elan #9298745 for sale

NANOMETRICS Caliper Elan
ID: 9298745
Wafer Size: 12"
Vintage: 2004
Accent optical caliper, 12" 2004 vintage.
NANOMETRICS Caliper Elan is a mask and wafer inspection equipment designed to accurately measure and log the presence, position and size of defects on semiconductor masks and wafers. The system utilizes an automated optical microscope unit and a precision measurement stage. The optical microscope is designed to provide low-powered objective lenses and high-powered stereo magnifications for imaging, as well as multi-spectral imaging including infrared and ultraviolet wavelengths. The precision measurement stage provides ultra-low inertia motion, quick settle times, and excellent motion fidelity. This machine is able to thoroughly inspect all production layers of a mask or wafer in greater detail than ever before. Using sophisticated algorithms and automated measurements, it can detect and classify defects of any size as well as determine their location and size. This ensures that not only can defects be identified and addressed, but that any larger, problematic defects are tracked to their source. Caliper Elan also features advanced 3D and critical dimension (CD) oversight capabilities. This makes it possible to quickly comprehend and inspect critical dimensions in the structures and structures of complex layers, anomalies in critical individual dimensions, or misalignment or shape differences in topography. Additionally, the tool can carry out component inspections for sidewall angle, die size and transparency, allowing for rapid and accurate diagnostics. Finally, NANOMETRICS Caliper Elan asset offers a user-friendly GUI with programmable templates and customizable views. The intuitive platform allows for easy data collection and efficient reporting. With built-in statistical review and reporting capabilities, users can generate standards-compliant wafer and mask maps, providing confidence of yields and supporting failure analysis. Overall, Caliper Elan is an advanced, highly efficient mask and wafer inspection model. Offering an unprecedented range of imaging and analysis capabilities, it is an invaluable tool for semiconductor producers who need to produce high-quality products quickly and accurately.
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