Used NANOMETRICS Caliper Elan #9378705 for sale

NANOMETRICS Caliper Elan is a state-of-the-art mask and wafer inspection equipment used for production-grade pattern inspection. It is designed to quickly and accurately detect patterns on a wide range of substrates including reticles, mask defects, wafer defects, printed circuit boards, and nano-scale lithography defects. The system offers a wide range of pattern and defect detection capabilities, and can be used to quickly identify potential problems in various production processes. The unit utilizes advanced optics, imaging, and electrical sensing technologies to precisely scan, image, and inspect target areas. The optics in the machine employ laser illumination, LED illumination, and waveguide techniques to ensure accurate defect detection and imaging. The imaging tool is made up of multiple cameras that provide a wide field of view, enabling the asset to capture extremely detailed images at high resolutions. Additionally, the model is capable of using automated optical metrology techniques to measure pattern characteristics, line widths, critical dimmensions, and other key parameters. On the electrical side of the equipment, it uses a variety of electrical sensing techniques to detect electrical problems in production, such as open-circuit and short-circuit defects, and is also capable of determining general electrical characteristics such as leakage current. The system combines these different sensing technologies with advanced pattern recognition algorithms to analyze patterns on the target substrates. This enables the unit to quickly identify potential mask defects, wafer defects, or other process-related problems. Finally, the machine is capable of providing high-speed, high-resolution results in a variety of formats, including metrology and color mapping. Caliper Elan also offers a variety of software and hardware options, so users can tailor the tool to their needs. By combining the best of imaging and electrical techniques, NANOMETRICS Caliper Elan provides highly accurate, detailed information about target patterns. This makes it an ideal choice for production-grade pattern inspections.