Used NANOMETRICS Caliper Mosaic #9378724 for sale

NANOMETRICS Caliper Mosaic is a powerful mask and wafer inspection system that provides extremely accurate critical dimensions and physical defects detection for the microelectronics manufacturing industry. It employs state-of-the-art optical and laser metrology to optimize throughput as well as quality control for each step in wafer and mask production. Caliper Mosaic uses an advanced optical design and laser scanning technology to accurately measure the profile of mask levels, substrate steps, overlay error, and image quality parameters. The system uses the wavelengths of visible or near-infrared light to capture both the surface and sub-surface features of the wafer or mask, and quickly detect subtle defects and non-conformities. The captured image is then analyzed using technology such as dark-field microscopy, interference microscopy, or a combination of both. NANOMETRICS Caliper Mosaic is capable of analyzing and measuring a variety of physical features, including lines and spaces, critical dimensions, film stack thickness, resist coverage, overlay error, critical area calculations, and surface roughness. It can also detect and measure defects such as pits, scratches, delaminations, contaminants, and stains on both the surface and subsurface of the wafer or mask. The system also offers a variety of features that make it an ideal solution for high-volume production. It can be integrated with several leading mask aligners, steppers, and printers, making it readily available to manufacturers in a wide range of industries. Caliper Mosaic is highly automated, with all settings and monitors being controlled through a touchscreen interface. It also includes several layers of security protocols to protect against unauthorized personnel access. NANOMETRICS Caliper Mosaic is an incredibly reliable tool for ensuring the quality and reliability of manufacture products for the ever-expanding microelectronics industry. Its precision and accuracy-driven design, automated features, and interoperability with major devices and equipment make it an ideal choice for ensuring high-levels of defect detection.