Used NANOMETRICS Caliper Mosaic #9383063 for sale

NANOMETRICS Caliper Mosaic is a mask and wafer inspection equipment that utilizes laser scanning in conjunction with planar imaging to obtain nanoscale images of patterned and unpatterned structures in wafers, masks, and related materials. The system offers three distinct functions: optically measuring, imaging, and mask metrology. Using laser scanning, Caliper Mosaic offers maximum measurement accuracy of less than 5nm in wafer map modes at 7.5 micron resolution (Nanometer). The unit also provides dynamic analysis of lapped films with precision measurements in the range of plus or minus 2 nanometers. Furthermore, with its automated reverse engineering software, the machine is capable of analyzing overlay measurement and registration data collected from the optically scanned, lithographically patterned surfaces. With its imaging capabilities, the tool can offer sub-micron resolution imaging of wafer and mask features. A high resolution, 5 megapixel objective is used to acquire images in the 15 micron range. The acquired images can also be adjusted, scaled, rotated and positioned as desired. Additionally, the asset offers integrated pattern comparison software that can be used to match optically scanned features and items against a list of pre-determined templates. NANOMETRICS Caliper Mosaic is also suitable for wide range of metrology operations in mask patterning, including probe alignment, overlay shift measurements, CD control, complex overlay analysis and component placement. It utilizes two matching NIST plated substrates to identify overlay shift and error. The resulting data is then used to perform a distortion analysis for overlay control. In conclusion, Caliper Mosaic is a highly sophisticated model that offers comprehensive mask and wafer inspection capabilities at nanoscale resolution level. It offers precise optically measuring, imaging and mask metrology capabilities which provide an in-depth understanding of the structure and pattern of materials used to create microelectronic devices. The equipment is invaluable for industrial applications that require tight measurement precision as it can be used to accurately shake and inspect target objects with maximum accuracy.