Used NANOMETRICS Caliper Mosaic #9383361 for sale

ID: 9383361
Vintage: 2011
Overlay control system 2011 vintage.
NANOMETRICS Caliper Mosaic is a mask and wafer inspection equipment designed to measure and analyze microstructure features on a variety of substrates. This advanced equipment applies optical metrology to accurately measure and inspect features down to the nanometer scale. This high-precision capability gives users the ability to make faster, more accurate and reliable measurements. The system works by scanning the substrate with a white light source to measure the profile of fine line features with a pixel size of up to 200nm. An array of 72 individual positions of lasers provide the illumination, each with three wavelength values. This allows the unit to measure the feature profile at up to 2500 points during a single scan. The optical metrology technique applied by the machine also includes 3D imaging. In addition to line feature inspection, it can also measure film thickness, height, and gap width between separate structures on the same substrate. All measurements are stored digitally for greater accuracy. Caliper Mosaic also includes a powerful image analysis software package. This software is capable of combining several scans, creating 3D models, stitching individual scans together to form a single data set, and much more. In addition to accuracy and real-time imaging, the software offers comprehensive data analysis tools, which allow for greater understanding of device performance or for defect isolation. NANOMETRICS Caliper Mosaic is a powerful and reliable tool for wafer and mask inspection. It can accurately measure, analyze, and quantify features at the nanometer scale, allowing users to make faster, more accurate decisions in a fraction of the time. With its comprehensive imaging and analysis functionalities, the tool provides a tailored solution for any complex nanostructured device.
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