Used NANOMETRICS Caliper Mosaic #9384480 for sale

NANOMETRICS Caliper Mosaic is a flexible, integrated, and powerful mask and wafer inspection equipment developed by NANOMETRICS to support advanced process control and improve yield in the semiconductor industry. The system features an optimized combination of automated optical inspection and imageprocessing capabilities, along with a suite of software tools to support image management and defect analysis. This enables the unit to detect and classify defects reliably. Image sensors used by the machine provide quick, low noise readouts in both phase position and transmission images. Binary images of the wafer are created and compared to customer-defined mask and product images, allowing for the detection of features as small as 3 nanometers in size. The inspection tool features a dual-beam confocal scanning microscope (DCSM) with exceptional depth-of-field and high-resolution imaging capabilities that allow for precise pinpointing and characterization of defects. The inspection asset utilizes a four-axis scanning stage that enables high-speed scanning with an accuracy of 250 nanometers in the X-Y plane. The model's image processing software includes algorithms that can detect very faint features, such as scratches, particles, and defects on the wafer surface, and feature and defect classification algorithms to distinguish between various types of defects. In addition, the equipment provides a powerful, user-friendly graphic user interface that simplifies the design, setting and running of inspection jobs, while also enabling automated detailed analysis and characterization of defect images, enabling users to accurately diagnose and solve yield and process problems quickly. Ultimately, Caliper Mosaic's combination of high-resolution imaging, automated image processing and intuitive software helps ensure customers' quality control and yield requirements are met.