Used NANOMETRICS Caliper Mosaic #9390470 for sale

NANOMETRICS Caliper Mosaic is a mask & wafer inspection equipment designed to analyze masks and wafers at the nanometer level. It is particularly useful for examining high-density patterns and features which are typically too small for conventional optical inspection systems. The streamlined optical design utilizes high-precision imaging optics along with advanced data acquisition techniques to create a comprehensive, automated wafer inspection system. Caliper Mosaic unit offers reliable and accurate quantitative analysis of wafer patterns down to a resolution of 10 nm. The machine is composed of imaging optics, a CCD camera, and a high-performance computing platform. Its advanced imaging optics are specifically designed to enhance the image clarity of small geometries while also minimizing the effect of scattered light on the imaging results. The tool is also capable of inspecting a broad range of substrates, including chrome masks, UV masks, reticles, and opaque wafers. The asset features a number of advanced technologies, such as a high-speed image acquisition model which minimizes distortion and cutting edge laser mapping techniques which operate at multiple wavelengths to attain unprecedented inspection accuracy. Advanced data analysis techniques such as pattern recognition and blur analysis further enhance the quality of the inspection process. The equipment can also be used to compare two images so that minor pattern discrepancies can be detected. The user-friendly system interface provides intuitive control over the wafer inspection process, with a variety of visualization options. Graphical displays show the results of the inspection, and the same software can be used to review patterns, analyze detected defects, and generate detailed reports. NANOMETRICS Caliper Mosaic unit can automatically optimize various parameters, such as focus, dicing lines, and the thresholds for pattern detection. Caliper Mosaic is designed to provide a comprehensive solution for wafer and mask inspection. With its high-resolution imaging and detailed defect detection, this robust inspection machine ensures accuracy, repeatability, and throughput.