Used NANOMETRICS Caliper Mosaic #9411495 for sale
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NANOMETRICS Caliper Mosaic is a sophisticated mask and wafer inspection equipment which provides depth of field imaging and high resolution measurements. This system offers unparalleled accuracy for critical overlay and 3D statistical process control applications. The unit provides the ultimate solution for process optimization, high data accuracy and repeatability, with the capability of providing a detailed analysis and characterization of critical masks and wafers. The optics package of Caliper Mosaic machine consists of high-end telecentric lenses, advanced telecentric lighting source, precise frame grabber and advanced image processing, which gels together to provide a high performance imaging solution. The telecentric lenses ensure high uniform lighting over a large field of view and therefore allows 3D volume inspection. This ensures precise registration of the wafer, the overlay registration and precise chamfer detection. The tool has the capability of providing precise measurement of critical dimensions and line widths with resolutions as low as one nanometer. The asset also has automated machine vision technology which allows it to analyze the 3D surface of the wafer or mask and provides precise metrics on its surface characteristics. The model is capable of detecting micro-defects such as particles, cracks, dopant diffusion and other anomalies across the surface of the wafers with extreme accuracy. This equipment also has advanced Fourier transform and Discrete Cosine Transform algorithms which accurately measures the spectrum, phase and contrast of the image. The system has both manual and automatic operation modes and offer ease of use. The manual mode provides the user with complete control over the imaging process with the ability to capture, edit and analyze images within the same environment. The automatic mode takes care of most of the steps like alignment and feature identification with the software. NANOMETRICS Caliper Mosaic unit also has a number of advanced data analysis tools which provides detailed information on the uniformity and surface characteristics of wafers and masks Overall, Caliper Mosaic machine is an advanced mask and wafer inspection tool which offers unprecedented accuracy and performance capabilities. With its high resolution measuring capabilities, 3D imaging capability and automated machine vision technology, this asset offers the ultimate solution for critical overlay and statistical process control applications.
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