Used NANOMETRICS Caliper Ultra #9244841 for sale

NANOMETRICS Caliper Ultra is a mask and wafer inspection equipment designed to improve the accuracy and precision of chip development. Utilizing advanced wafer imaging, Caliper Ultra delivers fast, reliable, and cost-effective results. The system supports a variety of wafer sizes ranging from 1 inch to 12 inches, and uses a high-powered magnification of up to 200x, combined with high resolution optics to deliver accurate images of the inspected features. The unit's imaging capabilities are further enhanced by advanced features such as thin-wafer alignment, extended field of view, multi-referencing, and autofocus. The machine's software suite is designed to assist with sample alignment, wafer and defect analysis, as well as image processing and reporting. It's intuitive, easy-to-use, and efficient. It automates a range of analysis tasks, including autofocus, XY alignments, and defect analysis. Automated measurements of selected wafer or die defects can be performed, as well as enabling measurement of critical features that are not accessible with traditional microscopes. NANOMETRICS Caliper Ultra is designed for spatial isolation and imaging of multiple types of defects. It features advanced algorithms for detection, analysis, and classification of defects, and provides fast, repeatable results. The tool is also designed to deliver pinpointed defect isolation and location for rapid characterization. In addition to its advanced features, the asset is easy to use and cost-effective. It includes integrated tools that help to optimize alignment, set up analysis parameters, and analyze results. The graphical user interface (GUI) is intuitive, and automated wafer identification and defect assessment features enable fast and rapid operation. Caliper Ultra provides a highly efficient and repeatable mask and wafer inspection solution. Its automated wafer handling capabilities and imaging algorithms provide rapid and accurate image assessment, and its acquisition, analysis, and reporting capabilities enable efficient and reliable defect placement results. The model is cost-effective, user friendly, and provides unsurpassed image quality, resolution, and accuracy.