Used NANOMETRICS CD-50-2 #9123936 for sale

NANOMETRICS CD-50-2 is a high-end mask and wafer inspection system designed for mask and wafer manufacturers. It is designed to provide mask and wafer makers a level of precision and accuracy that is unrivalled in the industry. With its precise optics, advanced image processing and nanoscale accuracy, CD-50-2 is able to provide manufacturers of masks and wafers with unparalleled levels of quality control. NANOMETRICS CD-50-2 utilizes an array of five laser modules that emit light of different wavelengths. These lasers are combined with a unique optics system which is designed to detect mask and wafer defects on a nanometer scale. CD-50-2 is able to accurately measure microscopic defects, from individual mask and wafer features down to atoms, and to see sub-surface defects. NANOMETRICS CD-50-2 also features a powerful image processing algorithm which allows it to detect even the most difficult to see defects. This powerful algorithm is able to accurately determine the locations and magnitudes of all defects, whether they are in the mask or wafer materials. In addition to its high-precision optics and image processing capability, CD-50-2 also features a comprehensive database of mask and wafer materials and specifications. This allows NANOMETRICS CD-50-2 to accurately determine the characteristics of any mask or wafer it is asked to inspect, and to generate detailed reports on the results. CD-50-2 is a powerful addition to the mask and wafer inspection field. Its high-precision optics and image processing capabilities allow it to detect even the smallest of defects, and its comprehensive database of mask and wafer materials allows it to accurately determine characteristics and generate detailed reports on the results. NANOMETRICS CD-50-2 is highly cost-effective, and is an ideal choice for the mask and wafer maker looking for the highest quality of product.