Used NANOMETRICS M-215 #9226304 for sale

NANOMETRICS M-215 is a high-end mask and wafer inspection equipment designed and manufactured by NANOMETRICS Incorporated. It offers a unique combination of imaging, metrology, and process monitoring capabilities for semiconductor mask makers and integrated circuit (IC) manufacturers. M-215 system utilizes the latest hand-held atomic force microscope technology, capable of scanning across two-dimensional surfaces with nanometer resolution and accuracy. It is designed with specific inspection capabilities for masks, wafers, and associated materials such as photoresist, polymers, thin films, lead frames, and other process residues. NANOMETRICS M-215 integrates Nanometer's patented "Planar Image Processing" (PIP) algorithm, giving it the ability to accurately measure critical topographical features on placed patterns and defects. PIP also allows technicians to view the image from multiple perspectives, enabling them to better isolate problematic regions. The unit comes with several conveniences, such as an intuitive graphical user interface (GUI). The GUI offers the capacity to perform various tasks on a given mask or wafer, like pattern recognition, defect recognition, and accurate sizing and characterization. This makes M-215 ideal for defect inspection and process optimization. In addition to PIP, NANOMETRICS M-215 features advanced algorithm-based automated image restoration capabilities for evaluating materials with non-uniform surfaces or fabrics. It is also capable of identifying flop-angles and accurately measuring desired parameters, such as line width, pitch, form factor, process elements, topology, and defects. Moreover, the machine is equipped with process-specific analysis capabilities, simulating various semiconductor process steps to check for compatibility and optimize their performance. In short, M-215 represents a sophisticated tool for any manufacturer or researcher involved in high-level mask and wafer inspection. With its combination of innovative imaging and metrology features, sophisticated algorithms, and reliable automated image restoration, the tool offers superior power and accuracy when it comes to inspecting and characterizing materials.