Used NANOMETRICS M-215 #9226306 for sale

NANOMETRICS M-215 is an Automated Mask/Wafer Inspection Equipment that provides a cost-effective and reliable inspection solution for any two-dimensional non-transparent surface. The system offers a comprehensive set of inspection and defect detection parameters, including features such as: Multi-tile inspections of the same area for improved reliability. High speed scanning up to 0.5 Gigapixel/second. Comprehensive defect detection covering defects from 0.1um to 50um in size. Automated calibration routines to ensure high reliability of results. Stable environment for temperature consistency and improved stability. Flexible feature set including automated defect detection, automated montage, automated defect classification, 3D registration and advanced pattern recognition. Comprehensive analysis parameters with a variety of display options. Application independent platform with easy integration of custom applications. M-215 unit is designed for use in the semiconductor and MEMS industries for the inspection of patterned wafers and masks up to 12 inches in size. The mask/wafer inspection unit consists of a slit-scanning head, an imaging plate and an optional tasking application module, a controller unit and an interfacing laptop. The slit-scanning head provides high speed image acquisition up to 0.5 Gigapixel per second, while the imaging plate ensures uniform image intensity. The optional tasking application module enables the user to define a variety of parameters for the inspection algorithm. Automated calibration routines are also available to ensure consistent and reliable results from multiple inspections. The controller unit provides an interface between the user's laptop and the mask/wafer inspection machine. Additionally, the interfacing laptop offers a variety of features for analysis and review of the data captured by the tool. In conclusion, NANOMETRICS M-215 is a cost-effective and reliable mask and wafer inspection asset offering a comprehensive set of inspection and defect detection parameters. Its multi-tile inspections of the same area, fast scanning speed, automated calibration routines and flexibility enables fast and accurate defect detection of any two-dimensional non-transparent surface. It is an ideal choice for the semiconductor and MEMS industry.