Used NANOMETRICS M6100A #9165235 for sale

NANOMETRICS M6100A is a high-performance mask and wafer inspection equipment designed for use in semiconductor manufacturing. It is used to detect any potential defects in circuits and components that may impact the performance of the end-product. M6100A offers several advanced features to enhance its performance and accuracy. An automated optical inspection system comprising a wide-angle CCD camera, lnPs (Laser-Reflected Pattern Recognition Processor), and off-axis illumination optics provides superior imaging of the photolithographic pattern. This unit is capable of inspecting wafers with resolutions down to 50 nanometers. A multi-zone high-energy laser is also available to expose very small pre-defined areas within the photolithographic pattern. An ultra-high resolution imaging machine facilitates the verification of defects and accuracy of the photolithographic pattern. NANOMETRICS M6100A is equipped with a high-precision stage which allows for precise alignment of wafers during inspection and wafer handling. The tool can accommodate wafers up to 200mm in diameter and is compatible with all leading wafer-processing frames. M6100A offers several other features to enhance its performance. An integrated low-vibration workstation allows for analysis of small structures with minimal disturbance due to external vibration. A nitrogen plasma scrubbing device is available to facilitate quick cleaning of the surface of the wafer prior to inspection. An integrated digital data acquisition asset allows users to visualize and store measurement results. Overall, NANOMETRICS M6100A is a powerful, high-performance mask and wafer inspection model designed for use in semiconductor manufacturing. It offers superior imaging capabilities, high resolution inspection, and precise wafer handling capabilities. The robust design and features make M6100A an ideal solution for quality-minded production of high-capacity electronic components.