Used NANOMETRICS M6100A #9243269 for sale

NANOMETRICS M6100A Mask & Wafer Inspection Equipment is a multi-talented, powerful, precision inspection tool designed to meet the ever-increasing needs of the wafer and mask inspection industry. M6100A system utilizes a high-resolution laser imaging unit for the inspection of wafer and mask patterns which enables it to achieve micron-level resolution. The machine is capable of detecting extremely small defects, such as broken wires and missing contacts, in a cost-efficient manner. NANOMETRICS M6100A tool has a variety of available options and features, including optical zoom and enhanced graphics capabilities. This asset is designed to meet the demands of a wide variety of mask and wafer technology applications, allowing the user to quickly and accurately obtain the highest possible image quality. The model is capable of operating with a variety of materials, including transparent and opaque layers, and supports both direct and indirect inspection. With M6100A, two 4-megapixel cameras are mounted behind a large, low-profile, lightweight, stainless steel frame to ensure smooth operation and maximum equipment accuracy. An LED-backlight enhances image contrast for greater results and reliability, while the long-life optical zoom lens allows for magnified views of extremely small details. In addition to these features, NANOMETRICS M6100A system has a variety of advanced off-line capabilities such as defect inspection and three-dimensional (3D) image generation. This makes it possible to review mask patterns and to detect defects quickly and easily. The unit is also capable of interpolating data from multiple sources, making it easier to identify and locate difficult-to-see defects. Furthermore, M6100A machine offers automated defect detection using intelligent pattern recognition algorithms, as well as manual parameters entry when needed. The automated defect detection ensures consistent performance when it comes to mask pattern review, while the manual parameters entry allows users to customize the search criteria in order to identify more subtle defects. This tool is also integrated with a variety of software and CAD systems, allowing the user to access data from source files directly, streamlining inspection processes. NANOMETRICS M6100A Mask & Wafer Inspection Asset is an advanced, high-resolution inspection tool capable of finding defects on masks and wafers that other inspection systems would miss. It provides the user with a cost-efficient means of obtaining high-quality results while providing a wide variety of features and capabilities, making it the ideal choice for inspection and verification of mask and wafer patterns.