Used NANOMETRICS M6100UV-L6 #9257609 for sale
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NANOMETRICS M6100UV-L6 is a mask and wafer inspection equipment that inspects integrated circuits during the fabrication process. It is capable of inspecting a variety of patterns and features, including miniflat structures, lines, and spaces. M6100UV-L6 scans surfaces with a laser beam for minute defects and deviations. Its optics system includes etched mirrors that cut down the size of the laser beam to achieve a magnification of up to 97x. The unit is equipped with a 360-degree CCD (charged coupled device) camera which provides a 3-dimensional perspective of the mask or wafer and uses high-resolution optics to identify defects down to 2 microns. The CCD camera also features auto-focus tracking that can detect and correct misalignment of the beam in the scan plane. Additionally, the optional backlight source ensures that dark features such as through-silicon vias are readily detected and highlighted. This scanner is also equipped with a variety of other features, including a motorized xyz stage, allowing for fast movement between various locations on a single wafer or mask. Moreover, high-resolution images can be quickly viewed and analyzed using the desktop application software that's included. The software allows users to generate and save reports that give detailed information about the nature, size and layout of any errant defects that are observed. Overall, NANOMETRICS M6100UV-L6 is an advanced mask and wafer inspection machine that offers numerous advantages, including highly detailed inspection records and the capability to easily pinpoint and identify any defective components. By providing detailed reports, engineers can pinpoint problems during development cycles and quickly identify and rectify them, resulting in faster production cycles and cost savings.
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