Used NANOMETRICS M6100UV #9239646 for sale

NANOMETRICS M6100UV is a high precision mask and wafer inspection equipment. It combines advanced imaging optics and powerful signal processing to quickly analyze masks and wafers for defects, with an automated job execution sequence controlled by user-friendly software and comprehensive database tools. The system's optical optics, motion control systems and algorithms provide superior detectability, and make M6100UV an ideal solution for various inspection applications. NANOMETRICS M6100UV is based on red and green LED with full-field illumination, and it is equipped with an infrared channel for defect indexing. The camera obtain image from the sample surface with a 4k resolution, while providing maximum viewing field up to 180 mm. It allows the sample to move with adaptive speed and resolution, enabling fast processing and accurate scan alignment. The point-to-point mirror alignment allows the unit to precisely detect nanoscale defects over the entire scanning range. The machine carries out a host of inspection processes, including automated surface inspection, image logging, automated acquire and indexing, defect classification, and dynamic mask verification. It allows the user to implement a wide variety of specialized defect analysis techniques that are more powerful than traditional approaches. Moreover, M6100UV supports a variety of mask types, including multiple device size masks, polychromatic masks, binary and gray-scale masks, and patterned wafers. This inspection tool features advanced signal processing and automated mask verification algorithms for a complete defect analysis. Powered by proprietary code scanning technology, it is capable of detecting, comparing and classifying minute defects with high accuracy. NANOMETRICS M6100UV is equipped with an advanced user interface that allows the user to configure and monitor jobs with ease, as well as to access comprehensive visual reports with accuracy indicators. In conclusion, M6100UV is an advanced mask and wafer inspection asset that offers fast and accurate images with maximum viewing field. It is equipped with a series of special features and algorithms, allowing the user to execute comprehensive defect analysis with great accuracy. The model is suitable for various inspection applications, and it provides a complete and reliable solution for the detection, comparison and classification of defects.